Features of Carbon and Silicon Thin Films Reflection Spectra in the Visible Region
УДК 539.216
Abstract
The article is devoted to the reflection of visible light from a thin absorbing film. For a number of reasons, thin films have recently been the subject of close study. As part of the work, several non-metal films were fabricated on a glass substrate: silicon films (by resistive evaporation) and carbon films (using laser evaporation). The resulting films have an optical thickness in the range of 1 μm (that is, the actual layer thickness is in the range of 0.2-0.4 μm) and at the same time noticeably absorb the light flux. The films were processed according to the standard method in the visible region using a USB4000 spectrometer. Reflection spectra for each of the films were plotted for several different points on the surface. The spectra look similar when differences in numerical values are not considered. The contribution of the interference of rays reflected from the front and rear boundaries is significant at long wavelengths (in the red region), whereas the interference practically disappears against the background of instrument noise in the short wavelength region (violet part of the spectrum). The reason for this is that absorption during propagation of the short-wavelength part inside the film significantly reduces the intensity of the beam reflected from the rear surface of the film.
Downloads
Metrics
References
Золотарев А.А. Современные материалы теплового контроля на основе углерода в микроэлектронике // Инновационные технологии в электронике и приборостроении : сб. докл. Российской научн.-технич. конф. с междунар. участием. М., 2021.
Иовдальский В.И., Пелипец О.В., Зубков Н.П., Ковалев В.И. Исследование состава алмазоподобных пленок углерода, используемых в изделиях микроэлектроники // Водородное материаловедение и химия углеродных наноматериалов : сб. докл. XI Международной конф. Ялта, 2009.
Мансуров Г.Н., Петрий О.А. Электрохимия тонких металлических пленок. М., 2011.
Хорьков К.С., Герке М.Н., Прокошев В.Г., Аракелян С.М. Образование тонких углеродных пленок при воздействии фемтосекундного лазерного излучения в вакууме // Известия вузов. Химия и химическая технология. 2012. Т. 55. № 6.
Григорьев Ф.В. Математическое моделирование процесса напыления тонких пленок, их структуры и свойств : дисс. ... д-ра физ.-мат. наук. М., 2019.
Маскаева Л.Н., Федорова Е.А., Марков В.Ф. Технология тонкопленочных покрытий. Екатеринбург, 2019.
Юнович А.Э. Оптические явления в полупроводниках. М., 1989.
Карпова А.А., Котова Е.И., Парфенова А.Д., Щеглов С.А. Метод измерения параметров тонких пленок, разработанный на основе методов интерферометрии переменного угла падения // Наука и инновации в технических университетах : матер. XIII Всероссийского форума студентов, аспирантов и молодых ученых. СПб., 2019.
Ландсберг Г.С. Оптика. М., 2010.
Блох А.Г., Журавлев Ю.А., Рыжов Л.Н. Теплообмен излучением: справочник. М., 1991.
Лизункова Д.А. Исследование электрических и оптических свойств фоточувствительных структур на наноструктурированном кремнии : дисс. ... канд. физ.-мат. наук. Самара, 2018.
Соломатин К.В., Елькина Е.А. Определение толщины тонкой углеродной пленки оптическими методами : сб. науч. ст. VI Российско-Казахстанской молод. научн.-технич. конф. «Новые материалы и технологии». Барнаул, 2018.
Copyright (c) 2022 Константин Васильевич Соломатин , Ольга Сергеевна Мельникова , Алексей Сергеевич Белоусов
This work is licensed under a Creative Commons Attribution 4.0 International License.
Izvestiya of Altai State University is a golden publisher, as we allow self-archiving, but most importantly we are fully transparent about your rights.
Authors may present and discuss their findings ahead of publication: at biological or scientific conferences, on preprint servers, in public databases, and in blogs, wikis, tweets, and other informal communication channels.
Izvestiya of Altai State University allows authors to deposit manuscripts (currently under review or those for intended submission to Izvestiya of Altai State University) in non-commercial, pre-print servers such as ArXiv.
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License (CC BY 4.0) that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).
