Features of Mass Transfer During Ion Implantation
УДК 519.7
Abstract
In this paper, the reaction products obtained by ion implantation of nitrogen, oxygen, and phosphorus into a tungsten target are investigated. The conditions for the creation of new compounds during high-dose implantation, leading to the processes of rapid mass transfer of ions into the target material, have been clarified. It has been established that ion implantation of nitrogen into tungsten leads to the appearance of the interstitial phase of W2N with FCC structure; oxygen implantation — to the formation of a phase with a close-packed structure of the FCC structure, which is similar in structure and parameters to W2O; phosphorus implantation — to the formation of tungsten phosphide W2P with an orthorhombic structure after additional annealing at temperatures exceeding 800-900 0С. An estimation has been made for the local pressure of the ion flux on the target surface which leads to a localized curvature of the crystal lattice due to which rapid mass transfer of implanted ions in the target material is possible.
The formation of interstitial phases during ion implantation is the result of shear deformation localization under conditions of accelerated mass transfer. Highly nonequilibrium supersaturated solid solutions, as well as highly defective structural-nonequilibrium states with a high curvature of the crystal lattice, are formed under conditions of high-dose ion implantation.
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